Thin film processing
Vmicro has access to a wide range of different techniques from sputtering tools to evaporators, LPCVD and PECVD, as well as oxidation and diffusion furnaces. We also provide solutions for thin films doping and annealing.
Deposition
- LPCVD low temperature oxide, doped or undoped polysilicon, low stress nitride
- Silicon oxides and nitrides by PECVD
- DC and RF sputtering of SiO2, Al, Au, Cr and Ti
- E-beam evaporation (lift-off compatible process) of various metals
Doping & annealing
- Doping by implantation or predeposition
- Standard annealing or RTA up to 1100°C
- Dopant profile engineering: from nanoscale channels to 3D micro and nanostructures
- Ohmic contact formation
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