Thin film processing

Vmicro has access to a wide range of different techniques from sputtering tools to evaporators, LPCVD and PECVD, as well as oxidation and diffusion furnaces. We also provide solutions for thin films doping and annealing.

  • LPCVD low temperature oxide, doped or undoped polysilicon, low stress nitride
  • Silicon oxides and nitrides by PECVD
  • DC and RF sputtering of SiO2, Al, Au, Cr and Ti
  • E-beam evaporation (lift-off compatible process) of various metals
Doping and annealing
  • Doping by implantation or predeposition
  • Standard annealing or RTA up to 1100°C
  • Dopant profile engineering: from nanoscale channels to 3D micro and nanostructures
  • Ohmic contact formation