Lithography : multi-scale capabilities

Vmicro’s completed and ongoing projects have involved multi-scale process engineering ranging from 100 nm to 100 µm. Today we are thus able to offer a large variety of advanced lithography processes both in optical and e-beam lithography.

  • Optical lithography from 100 µm to 1 µm
  • E-beam lithography from 1 µm to 50 nm
  • Fast prototyping <1µm with e-beam lithography on large areas
  • Wide range of resists: DUV, PMMA, Az nLOF, HSQ
  • Combine high resolution to thick resists for deep etching of high aspect ratio structures
  • Combine high resolution to high density patterning with advanced proximity correction