Vmicro’s completed and ongoing projects have involved multi-scale process engineering ranging from 100 nm to 100 µm. Today we are thus able to offer a large variety of advanced lithography processes both in optical and e-beam lithography.

• Optical lithography from 100 µm to 1 µm
• E-beam lithography from 1 µm to 50 nm
• Fast prototyping <1µm with e-beam lithography on large areas
• Wide range of resists: DUV, PMMA, Az nLOF, HSQ
• Combine high resolution to thick resists for deep etching of high aspect ratio structures
• Combine high resolution to high density patterning with advanced proximity correction