Lithography
Multi-scale capabilities
Vmicro has a long term experience of microfabrication engineering with design rules from 100 nm to 100 µm.
We are able to offer advanced lithography processes using e-beam and optical techniques.
- Optical lithography from 1 µm to 100µm
- E-beam lithography from 50 nm to 1µm
- Fast prototyping with e-beam lithography on large areas
- Wide range of resists: DUV, PMMA, Az nLOF, HSQ
- Proximity correction for dense patterns generation with 100kV ebeam
- Lithography sequences combining high resolution to thick resists. Mask engineering for deep etching of small structures
![lithography_02](https://vmicro.fr/wp-content/uploads/2023/09/lithography_02-1024x768.jpg)
![lithography_01](https://vmicro.fr/wp-content/uploads/2023/09/lithography_01-1024x768.jpg)
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