Multi-scale capabilities

Vmicro has a long term experience of microfabrication engineering with design rules from 100 nm to 100 µm. 

We are able to offer advanced lithography processes using e-beam and optical techniques.

  • Optical lithography from 1 µm to 100µm
  • E-beam lithography from 50 nm to 1µm
  • Fast prototyping with e-beam lithography on large areas
  • Wide range of resists: DUV, PMMA, Az nLOF, HSQ
  • Proximity correction for dense patterns generation with 100kV ebeam
  • Lithography sequences combining high resolution to thick resists. Mask engineering for deep etching of small structures
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